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This book focuses on the remarkable recent advances in understanding low pressure radio frequency glow discharges. It explains the basic analytical theory, plasma physics, and plasma diagnostics, before proceeding to the details of the etching process.
- Sales Rank: #3033066 in Books
- Published on: 1998-07-30
- Original language: English
- Number of items: 1
- Dimensions: 9.30" h x 1.00" w x 6.40" l, 1.50 pounds
- Binding: Hardcover
- 362 pages
About the Author
Professor Minoru Sugawara, Hachinohe Institute of Technology, Hachinohe-city, Aomori 031, Japan. Fax: (0) 178 25 1430
Most helpful customer reviews
1 of 1 people found the following review helpful.
ECR Plasma Etching
By A Customer
One of the only books available that contain theoretical and practicle information on ECR etching. A must for any etch engineers working in the semiconductor industry.
1 of 1 people found the following review helpful.
understanding plasma processes
By A Customer
Gives a detailed physical understanding on the fundamentals of plasma processes including Inductively Coupled Plasma and current advancements in etching processes.
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